文章信息/Info

Title:

Developments in Microwave Plasma Chemical Vapor Deposition Technology for Preparing High Quality Diamond Films

作者:

唐偉忠; 于盛旺; 范朋偉; 李義鋒; 蘇靜杰; 劉艷青

（北京科技大學(xué)材料科學(xué)與工程學(xué)院，北京100083）

Author(s):

TANG Weizhong; YU Shengwang;  FAN Pengwei; LI Yifeng; SU Jingjie; LIU Yanqing

（College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China）

關(guān)鍵詞:

MPCVD金剛石膜沉積技術(shù); 高品質(zhì)金剛石膜

DOI:

10.7502/j.issn.1674-3962.2012.08.06

文獻(xiàn)標(biāo)志碼:

A

摘要:

金剛石膜擁有許多優(yōu)異的性能。在制備金剛石膜的各種方法之中，高功率微波等離子體化學(xué)氣相沉積（MPCVD）法因其產(chǎn)生的等離子體密度高，同時(shí)金剛石膜沉積過程的可控性和潔凈性好，因而一直是制備高品質(zhì)金剛石膜的首選方法。在世界范圍內(nèi)，美、英、德、日、法等先進(jìn)國(guó)家均已掌握了以高功率MPCVD法沉積高品質(zhì)金剛石膜的技術(shù)。但在我國(guó)國(guó)內(nèi)，高功率MPCVD裝備落后一直是困擾我國(guó)高品質(zhì)金剛石膜制備技術(shù)發(fā)展的主要障礙。首先綜述國(guó)際上高功率MPCVD裝備和高品質(zhì)金剛石膜制備技術(shù)的發(fā)展現(xiàn)狀，包括各種高功率MPCVD裝置的特點(diǎn)。其后，回顧了我國(guó)金剛石膜MPCVD技術(shù)的發(fā)展歷史，并介紹北京科技大學(xué)近年來在發(fā)展高功率MPCVD裝備和高品質(zhì)金剛石膜制備技術(shù)方面取得的新進(jìn)展。

Abstract:

Diamond films possess many remarkable properties. Among the various techniques to deposit diamond films, high power microwave plasma chemical vapor deposition (MPCVD) method has the advantages of high density plasma, good controllability and clean environment free from electrode material contamination. Therefore, MPCVD has remains the primary technique useful for depositing high quality diamond films. Western countries have developed abilities to deposit high quality diamond films by using high power MPCVD techniques. In contrast, slow development in high power MPCVD apparatus has remained a main obstacle for China to develop its ability to produce high quality diamond films material. In this article, we first review the evolution of high power MPCVD diamond films deposition techniques both abroad and at home. Then, we will present new results of our recent effort to develop high power MPCVD diamond films deposition techniques.